About
Dr. David H. Wang founded ACM Research in 1998 and serves as its Chairman, Chief Executive Officer and President, and has been a director since 1998. He is the inventor of ACM's stress-free copper polishing technology and holds more than 100 patents in semiconductor equipment and process technology. Under his leadership ACM has built a broad portfolio of differentiated wet-processing tools spanning single-wafer cleaning, electrochemical plating, furnace, track, PECVD and advanced-packaging equipment, with operations conducted primarily through its ACM Research (Shanghai), Inc. subsidiary. He holds a Ph.D. and a Master of Engineering in precision engineering from Osaka University and a Bachelor of Science in precision instruments from Tsinghua University. David Wang and Jian Wang are brothers.
Roles
Fixed Compensation
FY 2025Performance Compensation
Data from FY 2025Cash incentive
Stock awards
Also at ACM Research, Inc.
See how Top Bucket AI works for your firm
Request DemoStay ahead of private markets
Research and market intelligence for private-markets professionals.
You're subscribed.
Thanks for signing up.